System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
US7242456B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2004 |
| Grant date | Jul 10, 2007 |
| Priority date | — |
| Expiry date | Nov 25, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.