Resins and photoresist compositions comprising same
US7244542B2 · kind B2 · utility
8Cited by
13References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 2003 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | May 30, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.