Inventor · Weston, MA, US

Young Cheol Bae

35Patents
9h-index
28Co-inventors
75Inventor score

Filing activity: May 27, 1993 → Nov 11, 2015

Most-cited inventions

PatentTitleAreaCited byStatus
US5545367A Rapid prototype three dimensional stereolithography Performing Operations; Transporting 283 Expired
US5569364A Separation media for electrophoresis Emerging Cross-Sectional Technologies 165 Expired
US5885432A Un-crosslinked polymeric media for electrophoresis Physics 146 Expired
US5880171A Fast curing polymeric compositions for ophthalmic lenses and apparatus for preparing lenses Physics 90 Expired
US5667735A Opthalmic mold coatings Performing Operations; Transporting 55 Expired
US8431329B2 Self-aligned spacer multiple patterning methods Electricity 19 Active
US8790867B2 Methods of forming photolithographic patterns by negative tone development Physics 15 Active
US6657031B1 Reworkable thermosetting resin compositions Electricity 12 Expired
US8975001B2 Photoresist compositions and methods of forming photolithographic patterns Physics 12 Active
US7244542B2 Resins and photoresist compositions comprising same Emerging Cross-Sectional Technologies 8 Expired
US8492068B2 Methods of forming electronic devices Electricity 8 Active
US5551663A Plastic molds for ophthalmic devices and methods for forming same Performing Operations; Transporting 8 Expired
US8697338B2 Photolithographic methods Electricity 7 Active
US5459176A Radiation curable coating for plastic articles Emerging Cross-Sectional Technologies 7 Expired
US8921031B2 Photoresist overcoat compositions and methods of forming electronic devices Emerging Cross-Sectional Technologies 7 Active
US8609891B2 Photoacid generators and photoresists comprising same Physics 5 Active
US8507185B2 Methods of forming electronic devices Electricity 5 Active
US8628911B2 Polymers, photoresist compositions and methods of forming photolithographic patterns Chemistry; Metallurgy 4 Active
US8465901B2 Methods of adjusting dimensions of resist patterns Electricity 3 Active
US9128379B2 Photolithographic methods Electricity 3 Active
US8980536B2 Developer compositions and methods of forming photolithographic patterns Emerging Cross-Sectional Technologies 3 Active
US8614050B2 Polymers, photoresist compositions and methods of forming photolithographic patterns Physics 3 Active
US9458348B2 Photoresist overcoat compositions and methods of forming electronic devices Emerging Cross-Sectional Technologies 2 Active
US8394571B2 Methods of forming electronic devices Electricity 2 Active
US8338079B2 Compositions and methods for forming electronic devices Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.