Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime

US7245420B2 · kind B2 · utility

Assignee

• Lambda Physik AG · DE

Inventors

• Sergei V. Govorkov · Mountain View, US
• Gongxue Hua · Coral Springs, US
• Timur Misuryaev · Coral Springs, US
• Alexander Wiessner · Oettingen, DE
• Thomas Schmidt · Freiburg (Elbe), DE
• Rainer Paetzel · Dransfeld, DE

Key dates

• Filing date: Jan 18, 2007
• Grant date: Jul 17, 2007
• Expiry date: Jan 18, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S3/235
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.