Orientation dependent shielding for use with dipole illumination techniques
US7246342B2 · kind B2 · utility
22Cited by
7References
26Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 25, 2003 |
| Grant date | Jul 17, 2007 |
| Priority date | — |
| Expiry date | Jan 6, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70941
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.