Substrate heating apparatus and manufacturing method for the same
US7247818B2 · kind B2 · utility
3Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2005 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | Jun 9, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B3/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate heating apparatus includes a ceramic base having a concave heating surface on which a substrate is placed, and a resistance heating element buried in the ceramic base. The central part of the concave heating surface defines the lowest point of the heating surface and the peripheral part of the concave heating surface defines the highest point of the heating surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.