Substrate heating apparatus
US7247819B2 · kind B2 · utility
12Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2005 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | Jun 23, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B3/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate heating apparatus is provided, including a base group including a plurality of bases, which are arranged substantially into a plate with a gap interposed between the bases, and which form a substrate mounting surface. A resistance heating element provided for at least one of the bases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.