Planarized perpendicular pole tip system and method for manufacturing the same
US7248434B2 · kind B2 · utility
7Cited by
16References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2004 |
| Grant date | Jul 24, 2007 |
| Priority date | — |
| Expiry date | May 11, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49032
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a pole tip structure for a magnetic head is provided. An etch stop layer is initially deposited after which a transfer layer is deposited. Further deposited is at least one masking layer. Reactive ion etching is then performed to define a trench in at least the transfer layer. A pole tip layer is then deposited in the trench to define a pole tip structure flanked at least in part by the transfer layer. A surface of the transfer layer or etch stop layer then remains in co-planar relationship with a surface of the pole tip structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.