Exposing method, exposing apparatus and device manufacturing method utilizing them
US7251014B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 30, 2004 |
| Grant date | Jul 31, 2007 |
| Priority date | — |
| Expiry date | Jul 14, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposing method which can effect the cleaning of an optical element so that throughput may not be substantially reduced when exposure using ultraviolet light is effected. The exposing method applies ultraviolet light emitted from a light source to an object to be exposed through a first isolated chamber including an optical surface, and a second isolated chamber including an optical surface to thereby expose the object to be exposed by the light. The method includes a first cleaning step of supplying a cleaning gas to the first isolated chamber to thereby clean the optical surface included in the first isolated chamber, and a second cleaning step of supplying a cleaning gas to the second isolated chamber to thereby clean the optical surface included in the second isolated chamber, wherein the start of the first cleaning step is later than the start of the second cleaning step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.