Lithographic apparatus and device manufacturing method
US7253875B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2006 |
| Grant date | Aug 7, 2007 |
| Priority date | — |
| Expiry date | Mar 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.