Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
US7253907B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 23, 2004 |
| Grant date | Aug 7, 2007 |
| Priority date | — |
| Expiry date | Dec 10, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70266
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A measuring method for measuring a wave front of light, which has passed through a target optical system. The method includes the steps of dividing the light that passes the target optical system into a first wave front and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, obtaining information concerning an interference fringe using shearing interference with divided light, calculating a differential wave front between the first wave front and the second wave front by using the information concerning the interference fringe obtained in the obtaining step, and correcting the differential wave front based on the predetermined amount and a wave number in the predetermined direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.