Polishing pad having grooved window therein and method of forming the same
US7258602B2 · kind B2 · utility
23Cited by
12References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2004 |
| Grant date | Aug 21, 2007 |
| Priority date | — |
| Expiry date | Jun 16, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/26
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing pad having grooved window therein is provided. The polishing pad comprises a polishing layer and a window, wherein the polishing layer has at least one first groove therein and the window has at least one second groove therein. More particularly, the first groove is deeper than the second groove. The polishing pad having a grooved window therein has advantages of providing precise endpoint detection and thereby reducing or resolving defect problems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.