Salt suitable for an acid generator and a chemically amplified resist composition containing the same
US7262321B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 7, 2006 |
| Grant date | Aug 28, 2007 |
| Priority date | — |
| Expiry date | Sep 7, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2601/14
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a salt of the formula (I):wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2.The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.