Fortified, compensated and uncompensated process-sensitive scatterometry targets
US7265850B2 · kind B2 · utility
11Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2003 |
| Grant date | Sep 4, 2007 |
| Priority date | — |
| Expiry date | Feb 1, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/34
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scatterometry target is provided in which a plurality of parallel elongated features are placed, each having a length in a lengthwise direction. A plurality of stress-relief features are disposed at a plurality of positions along the length of each elongated feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.