Inventor · Fishkill, NY, US

Matthew Sendelbach

26Patents
8h-index
51Co-inventors
78Inventor score

Filing activity: Mar 26, 1997 → Apr 18, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US5880007A Planarization of a non-conformal device layer in semiconductor fabrication Electricity 44 Expired
US5811357A Process of etching an oxide layer Electricity 37 Expired
US6001740A Planarization of a non-conformal device layer in semiconductor fabrication Electricity 16 Expired
US7286247B2 Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty Electricity 15 Expired
US6361402B1 Method for planarizing photoresist Electricity 13 Expired
US7265850B2 Fortified, compensated and uncompensated process-sensitive scatterometry targets Electricity 11 Expired
US6066566A High selectivity collar oxide etch processes Electricity 8 Expired
US5976982A Methods for protecting device components from chemical mechanical polish induced defects Electricity 8 Expired
US9330985B2 Automated hybrid metrology for semiconductor device fabrication Electricity 7 Active
US10209206B2 Method and system for determining strain distribution in a sample Physics 5 Active
US10664638B1 Measuring complex structures in semiconductor fabrication Electricity 3 Active
US7453583B2 Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty Electricity 1 Active
US10876959B2 Method and system for optical characterization of patterned samples Physics 1 Active
US7107177B2 Combining multiple reference measurement collections into a weighted reference measurement collection Physics 1 Expired
US8157978B2 Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer Electricity 1 Active
US11450541B2 Metrology method and system Electricity 0 Active
US7760360B2 Monitoring a photolithographic process using a scatterometry target Electricity 0 Active
US11300948B2 Process control of semiconductor fabrication based on spectra quality metrics Emerging Cross-Sectional Technologies 0 Active
US10916404B2 TEM-based metrology method and system Electricity 0 Active
US11295969B2 Hybridization for characterization and metrology Physics 0 Active
US11309162B2 TEM-based metrology method and system Electricity 0 Active
US10302414B2 Scatterometry method and system Physics 0 Active
US11710616B2 TEM-based metrology method and system Electricity 0 Active
US11885737B2 Method and system for optical characterization of patterned samples Physics 0 Active
US7791723B2 Optical measurement using fixed polarizer Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.