Optical arrangement and projection exposure system for microlithography with passive thermal compensation

US7274430B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Christian Wagner · Rosenheim, DE
• Michael Trunz · Pfahlheim, DE
• Ralf Hilgers · Aalen, DE

Key dates

• Filing date: Aug 21, 2001
• Grant date: Sep 25, 2007
• Expiry date: Aug 5, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70358
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.