Radiation system, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7274432B2 · kind B2 · utility
1Cited by
2References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 29, 2004 |
| Grant date | Sep 25, 2007 |
| Priority date | — |
| Expiry date | Apr 8, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70208
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation system for multiplexing radiation includes two radiation sub-sources. The sub-sources each provide a certain amount of radiation. The system further includes a member with reflecting surfaces. The surfaces are arranged in such a way that they receive the radiation from the sub-sources and combine this radiation. The radiation sub-sources may operate simultaneously or alternately. The surfaces may perform functions such as filtering or (de)magnifying.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.