Pattern evaluation system, pattern evaluation method and program
US7274820B2 · kind B2 · utility
3Cited by
4References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 24, 2002 |
| Grant date | Sep 25, 2007 |
| Priority date | — |
| Expiry date | Mar 25, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
a pattern evaluation system which receives image data of a pattern to be evaluated to evaluate the pattern includes an edge model producing part which produces a pattern edge model and an edge point coordinate detecting part which carries out an image matching processing to an image of the pattern with the pattern edge model to detect coordinates of an edge point of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.