Patent · US Expired

Measurement system with an optical measurement arrangement

US7277190B2 · kind B2 · utility

0Cited by

12References

9Claims

0Family size

Assignee

Vistec Semiconductor Systems Jena GmbH · DE

Inventors

Matthias Slodowski · Jena, DE
Detlef Wolter · Jena, DE

Key dates

Filing date	Feb 19, 2004
Grant date	Oct 2, 2007
Priority date	—
Expiry date	Jun 3, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG01N21/9501
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The invention concerns an optical measurement arrangement, in particular for the examination of layer systems, and can include an illumination device having at least one illumination source for delivering a measurement light beam and coupling the measurement light beam into the beam path of a layer thickness measuring instrument. In such a measurement arrangement, the illumination device can be housed in a lamp housing that may be detachably connected to the remaining portion of the measurement arrangement via an installation element wherein illumination sources can be prealigned with respect to the beam path.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.