Matthias Slodowski
6Patents
3h-index
11Co-inventors
50Inventor score
Filing activity: Nov 6, 2000 → Dec 10, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6456373B1 | Method and apparatus for monitoring the light emitted from an illumination apparatus for an optical measuring instrument | Electricity | 39 | Expired |
| US8148702B2 | Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns | Electricity | 7 | Active |
| US6618154B2 | Optical measurement arrangement, in particular for layer thickness measurement | Physics | 3 | Expired |
| US6775583B2 | Method and apparatus for user guidance in optical inspection and measurement of thin films and substrates, and software therefore | Electricity | 2 | Expired |
| US7349106B2 | Apparatus and method for thin-layer metrology | Electricity | 1 | Expired |
| US7277190B2 | Measurement system with an optical measurement arrangement | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.