Method and apparatus for controlling the output of a gas discharge laser system
US7277464B2 · kind B2 · utility
4Cited by
60References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2005 |
| Grant date | Oct 2, 2007 |
| Priority date | — |
| Expiry date | Aug 20, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.