Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
US7283294B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2005 |
| Grant date | Oct 16, 2007 |
| Priority date | — |
| Expiry date | Dec 20, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A catadioptric optical system comprising a first imaging optical system including a concave mirror and forming an intermediate image of a first object, said first imaging optical system forming a reciprocating optical system that an incidence light and reflected light pass, a second imaging optical system for forming an image of the intermediate image onto a second object, and a first optical path deflective member, provided between the concave mirror and the intermediate image, for introducing a light from the first imaging optical system to the second imaging optical system, wherein said first optical path deflective member deflects a light in such a direction that a forward path of the first imaging optical system intersects a return path of the first imaging optical system, and wherein said intermediate image is formed without an optical element after a deflection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.