Radiation-sensitive elements and their storage stability
US7285372B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2003 |
| Grant date | Oct 23, 2007 |
| Priority date | — |
| Expiry date | Feb 17, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/118
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.