Patent · US Active

Method of manufacturing ZnO substrate from ZnO crystal formed by hydrothermal synthesis method

US7288208B2 · kind B2 · utility

1Cited by
18References
8Claims
0Family size

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Key dates

Filing dateMar 29, 2006
Grant dateOct 30, 2007
Priority date
Expiry dateJun 16, 2026

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B33/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Li impurities are removed from a substrate of ZnO formed by a hydrothermal synthesis method. The surface layer of the substrate with Li impurities removed, is etched to planarize the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.