Lithographic apparatus, device manufacturing method and device manufacturing thereby
US7289212B2 · kind B2 · utility
113Cited by
35References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 16, 2004 |
| Grant date | Oct 30, 2007 |
| Priority date | — |
| Expiry date | Aug 4, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.