Image control in a metrology/inspection positioning system
US7289215B2 · kind B2 · utility
4Cited by
41References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2007 |
| Grant date | Oct 30, 2007 |
| Priority date | — |
| Expiry date | Jan 18, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B7/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metrology system includes a positioning system that produces linear and rotational motion between an imaging system and the wafer. The imaging system produces signals representing the image of the wafer in the field of view of the imaging system. A control system receives and processes the image signals, and generates corrected signals that compensate for rotational movement between the imaging system and the wafer. In response to the corrected signals, a monitor displays an image with the orientation of features on the wafer within the field of view unaffected by the rotational movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.