Patent · US Expired

Method and apparatus for spatially resolved polarimetry

US7289223B2 · kind B2 · utility

2Cited by
16References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 29, 2004
Grant dateOct 30, 2007
Priority date
Expiry dateJul 23, 2025

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01J4/04
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and an apparatus for the spatially resolved polarimetric examination of an imaging beam pencil (1) generated by an associated pulsed radiation source (9). A first and a second photoelastic modulator (6a, 6b) and a polarization element (5) are introduced serially into the beam path of the beam pencil. A control unit (8) activates a first modulation oscillation of the first photoelastic modulator and a second modulation oscillation of the second photoelastic modulator and drives the radiation source for outputting a respective radiation pulse in a manner dependent on the oscillation state of the first photoelastic modulator and/or the second photoelastic modulator. A detector (4) detects the beam pencil coming from the polarization element in a spatially resolved manner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.