Patent · US Active

Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same

US7294814B2 · kind B2 · utility

8Cited by

18References

41Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Cristian Wagner · Aalen, DE
Michael Gerhard · Aalen, DE
Gerald Richter · Aachen, DE

Key dates

Filing date	Sep 20, 2006
Grant date	Nov 13, 2007
Priority date	—
Expiry date	Sep 20, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70266
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.