Patent · US Expired

Micromechanical cap structure and a corresponding production method

US7294894B2 · kind B2 · utility

0Cited by
1References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 4, 2002
Grant dateNov 13, 2007
Priority date
Expiry dateJul 4, 2022

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/031
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A micromechanical cap structure and a corresponding manufacturing method are described. The micromechanical cap structure includes a first wafer with a micromechanical functional structure, and a second wafer to form a cap over the micromechanical functional structure. The first and second wafers have in their interior a support structure with a metal-semiconductor contact, and in their edge zone a bonding structure. The edge zone of the second wafer, when in the capped state, is arched in relation to the interior of the second wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.