Micromechanical cap structure and a corresponding production method
US7294894B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 4, 2002 |
| Grant date | Nov 13, 2007 |
| Priority date | — |
| Expiry date | Jul 4, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/031
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A micromechanical cap structure and a corresponding manufacturing method are described. The micromechanical cap structure includes a first wafer with a micromechanical functional structure, and a second wafer to form a cap over the micromechanical functional structure. The first and second wafers have in their interior a support structure with a metal-semiconductor contact, and in their edge zone a bonding structure. The edge zone of the second wafer, when in the capped state, is arched in relation to the interior of the second wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.