Integrated thermal unit having a shuttle with two-axis movement
US7297906B2 · kind B2 · utility
4Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2005 |
| Grant date | Nov 20, 2007 |
| Priority date | — |
| Expiry date | Jul 5, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67751
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated thermal unit comprises a bake station comprising a bake plate configured to hold and heat a substrate; a chill station comprising a chill plate configured to hold and cool a substrate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the chill plate along a horizontally linear path within the thermal unit and raise and lower substrates along a vertical path within the integrated thermal unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.