Patent · US Expired

Column simultaneously focusing a particle beam and an optical beam

US7297948B2 · kind B2 · utility

6Cited by
89References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 6, 2005
Grant dateNov 20, 2007
Priority date
Expiry dateDec 6, 2025

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31749
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.