Method for producing a semiconductor component having a movable mass in particular, and semiconductor component produced according to this method

US7300854B2 · kind B2 · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Hubert Benzel · Neckartenzlingen, DE
• Heribert Weber · Leverkusen, DE
• Frank Schaefer · Lörrach, DE

Key dates

• Filing date: Dec 6, 2001
• Grant date: Nov 27, 2007
• Expiry date: Oct 7, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S438/96
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of producing a semiconductor component, e.g., a multilayer semiconductor component, and a semiconductor component produced by this method, where the semiconductor component has, e.g., a mobile mass, i.e., an oscillator structure.A method easily and inexpensively produce a micromechanical component having monocrystalline oscillator structures, such as an acceleration sensor or a rotational rate sensor for example, by surface micromechanics, a first porous layer is formed in the semiconductor component in a first step and a cavity, i.e., a cavern, is formed beneath or out of the first porous layer in the semiconductor component in a second step.