Salt suitable for an acid generator and a chemically amplified resist composition containing the same
US7301047B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2006 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Oct 26, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2602/42
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a salt of the formula (I):wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 1 to 12.The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.