Supporting plate, stage device, exposure apparatus, and exposure method
US7301606B2 · kind B2 · utility
7Cited by
17References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 26, 2004 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Jan 7, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
For example, to control an effect due to entrance and leakage of liquid for exposure and allow a preferable exposure processing, a support surface is provided which supports an object. The support surface is liquid repellant, and a collection device is provided which collects liquid from the support surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.