Graphics engine for high precision lithography
US7302111B2 · kind B2 · utility
34Cited by
27References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2001 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Aug 4, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T15/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims, specification and drawings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.