Method and system for context-specific mask writing
US7302672B2 · kind B2 · utility
46Cited by
33References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2005 |
| Grant date | Nov 27, 2007 |
| Priority date | — |
| Expiry date | Jan 10, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/78
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for generating lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.