Robert C. Pack
16Patents
9h-index
18Co-inventors
65Inventor score
Filing activity: Dec 29, 2000 → Dec 13, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7231628B2 | Method and system for context-specific mask inspection | Physics | 279 | Expired |
| US8453102B1 | Hierarchical variation analysis of integrated circuits | Emerging Cross-Sectional Technologies | 50 | Active |
| US7302672B2 | Method and system for context-specific mask writing | Physics | 46 | Expired |
| US6562638B1 | Integrated scheme for predicting yield of semiconductor (MOS) devices from designed layout | Electricity | 35 | Expired |
| US8468482B1 | Modeling and simulating the impact of imperfectly patterned via arrays on integrated circuits | Emerging Cross-Sectional Technologies | 27 | Active |
| US7249342B2 | Method and system for context-specific mask writing | Physics | 22 | Expired |
| US9343267B2 | Method and system for dimensional uniformity using charged particle beam lithography | Electricity | 12 | Active |
| US7024638B2 | Method for creating patterns for producing integrated circuits | Physics | 12 | Expired |
| US9038003B2 | Method and system for critical dimension uniformity using charged particle beam lithography | Physics | 10 | Active |
| US8407627B2 | Method and system for context-specific mask inspection | Physics | 5 | Active |
| US8959463B2 | Method and system for dimensional uniformity using charged particle beam lithography | Electricity | 4 | Active |
| US7784016B2 | Method and system for context-specific mask writing | Physics | 3 | Active |
| US9859100B2 | Method and system for dimensional uniformity using charged particle beam lithography | Electricity | 2 | Active |
| US8745549B2 | Method and system for forming high precision patterns using charged particle beam lithography | Electricity | 1 | Active |
| US10055535B2 | Method, system and program product for identifying anomalies in integrated circuit design layouts | Emerging Cross-Sectional Technologies | 0 | Active |
| US10431422B2 | Method and system for dimensional uniformity using charged particle beam lithography | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.