Salt suitable for an acid generator and a chemically amplified resist composition containing the same
US7304175B2 · kind B2 · utility
65Cited by
1References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2006 |
| Grant date | Dec 4, 2007 |
| Priority date | — |
| Expiry date | Mar 2, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a salt of the formula (I)wherein X represents —OH or —Y—OH, n shows an integer of 1 to 9, A+ represents an organic counter ion, Y represents a divalent saturated aliphatic hydrocarbon group having 1 to 6 carbon atoms.The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.