System and method for maskless lithography using an array of sources and an array of focusing elements
US7304318B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | Mar 16, 2005 |
| Grant date | Dec 4, 2007 |
| Priority date | — |
| Expiry date | Feb 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.