Lithographic apparatus, device manufacturing method and substrate
US7307687B2 · kind B2 · utility
1Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2006 |
| Grant date | Dec 11, 2007 |
| Priority date | — |
| Expiry date | Jun 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2043
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.