Cleaning solution for semiconductor substrate
US7312186B2 · kind B2 · utility
18Cited by
0References
9Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 5, 2004 |
| Grant date | Dec 25, 2007 |
| Priority date | — |
| Expiry date | Jul 27, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning solution for semiconductor substrates comprising a nonionic surface active agent of the formula (1) and/or the formula (2), a chelating agent and a chelating accelerator:CH3—(CH2)l—O—(CmH2mO)n—X (1)wherein l, m and n independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group;CH3—(CH2)a—O—(CbH2bO)d—(CxH2xO)y—X (2)wherein a, b, d, x and y independently represent a positive number, b and x are different, and X represents a hydrogen atom or a hydrocarbon group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.