Process to optimize properties of polymer pellicles and resist for lithography applications
US7314667B2 · kind B2 · utility
7Cited by
26References
15Claims
0Family size
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Key dates
| Filing date | Mar 12, 2004 |
| Grant date | Jan 1, 2008 |
| Priority date | — |
| Expiry date | Sep 16, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.