Fu-Chang Lo
7Patents
3h-index
6Co-inventors
46Inventor score
Filing activity: Aug 24, 2001 → Aug 11, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6607862B2 | Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making | Physics | 16 | Expired |
| US7264853B2 | Attaching a pellicle frame to a reticle | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7314667B2 | Process to optimize properties of polymer pellicles and resist for lithography applications | Emerging Cross-Sectional Technologies | 7 | Expired |
| US7316869B2 | Mounting a pellicle to a frame | Emerging Cross-Sectional Technologies | 3 | Expired |
| US8012651B2 | Mounting a pellicle to a frame | Emerging Cross-Sectional Technologies | 1 | Active |
| US8551675B2 | Mounting a pellicle to a frame | Emerging Cross-Sectional Technologies | 0 | Active |
| US7763395B2 | Radiation stability of polymer pellicles | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.