Patent · US Active

Metal resistor, resistor material and method

US7314786B1 · kind B1 · utility

14Cited by
6References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 16, 2006
Grant dateJan 1, 2008
Priority date
Expiry dateJun 16, 2026

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH04W88/18
  • WIPO fieldDigital communication
  • WIPO sectorElectrical engineering

Abstract

A metal resistor and resistor material and method of forming the metal resistor are disclosed. The metal resistor may include an infused metal selected from the group consisting of: copper (Cu) infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W), and aluminum infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W). The method is less complex than conventional processes, allows control of the resistance by the amount of infusion material infused, and is compatible with conventional BEOL processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.