Kaushik Chanda
54Patents
10h-index
72Co-inventors
77Inventor score
Filing activity: Apr 9, 2003 → Sep 21, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7397260B2 | Structure and method for monitoring stress-induced degradation of conductive interconnects | Electricity | 167 | Expired |
| US6784105B1 | Simultaneous native oxide removal and metal neutral deposition method | Electricity | 23 | Expired |
| US7745282B2 | Interconnect structure with bi-layer metal cap | Electricity | 20 | Active |
| US8056039B2 | Interconnect structure for integrated circuits having improved electromigration characteristics | Electricity | 18 | Active |
| US8232646B2 | Interconnect structure for integrated circuits having enhanced electromigration resistance | Electricity | 17 | Active |
| US9935052B1 | Power line layout in integrated circuits | Electricity | 14 | Active |
| US7314786B1 | Metal resistor, resistor material and method | Electricity | 14 | Active |
| US8120179B2 | Air gap interconnect structures and methods for forming the same | Electricity | 13 | Active |
| US8633707B2 | Stacked via structure for metal fuse applications | Electricity | 12 | Active |
| US9685404B2 | Back-end electrically programmable fuse | Electricity | 11 | Active |
| US7737528B2 | Structure and method of forming electrically blown metal fuses for integrated circuits | Electricity | 10 | Active |
| US7749778B2 | Addressable hierarchical metal wire test methodology | Emerging Cross-Sectional Technologies | 10 | Active |
| US8232645B2 | Interconnect structures, design structure and method of manufacture | Electricity | 9 | Active |
| US8420537B2 | Stress locking layer for reliable metallization | Electricity | 9 | Active |
| US8383507B2 | Method for fabricating air gap interconnect structures | Electricity | 8 | Active |
| US9142506B2 | E-fuse structures and methods of manufacture | Electricity | 7 | Active |
| US7830019B2 | Via bottom contact and method of manufacturing same | Electricity | 7 | Active |
| US8962467B2 | Metal fuse structure for improved programming capability | Emerging Cross-Sectional Technologies | 6 | Active |
| US7732924B2 | Semiconductor wiring structures including dielectric cap within metal cap layer | Electricity | 5 | Active |
| US7521952B2 | Test structure for electromigration analysis and related method | Physics | 4 | Active |
| US7776737B2 | Reliability of wide interconnects | Electricity | 4 | Active |
| US7683651B2 | Test structure for electromigration analysis and related method | Physics | 4 | Active |
| US7563704B2 | Method of forming an interconnect including a dielectric cap having a tensile stress | Electricity | 4 | Active |
| US7202159B2 | Diffusion barriers comprising a self-assembled monolayer | Electricity | 4 | Expired |
| US10048306B1 | Methods and apparatus for automated integrated circuit package testing | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.