Lithographic apparatus and device manufacturing method
US7315346B2 · kind B2 · utility
16Cited by
16References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2003 |
| Grant date | Jan 1, 2008 |
| Priority date | — |
| Expiry date | Dec 12, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/0057
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.