Multiple wavelength X-ray source
US7317784B2 · kind B2 · utility
21Cited by
4References
25Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 19, 2006 |
| Grant date | Jan 8, 2008 |
| Priority date | — |
| Expiry date | Jan 19, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/081
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A multiple wavelength X-ray source includes an electron-generating cathode and an anode with multiple target regions, each of which emits X-rays at a different characteristic wavelength in response to the electrons. The different X-ray radiation outputs are focused by different focusing sections of a focusing optic. The multiple focusing sections are in different respective locations, and each focuses its respective X-ray radiation onto a sample. The focusing sections may be side-by-side mirrors in a Kirkpatrick-Baez configuration, or in a single-bounce, doubly curved elliptical configuration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.