Device for capacitive pressure measurement and method for manufacturing a capacitive pressure measuring device
US7321156B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2004 |
| Grant date | Jan 22, 2008 |
| Priority date | — |
| Expiry date | Oct 20, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L9/0073
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device for manufacturing a capacitive pressure measurement includes an insulated base electrode, a mechanically deflectable counterelectrode composed of a layer made of at least one of a monocrystalline and polycrystalline semiconductor material, a contact arrangement for electrically connecting the electrodes, and at least one semiconductor component, all integrated onto a semiconductor substrate. The connection for the base electrode is formed by an electrically insulated conductive polycrystalline semiconductor layer. The method for manufactured the device includes the step of arranging a conductive polycrystalline semiconductor layer between two insulating layers on the semiconductor substrate for forming a base electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.