Negative type radiation sensitive resin composition
US7323284B2 · kind B2 · utility
0Cited by
8References
15Claims
0Family size
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Key dates
| Filing date | Jun 17, 2002 |
| Grant date | Jan 29, 2008 |
| Priority date | — |
| Expiry date | Oct 7, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative type radiation sensitive resin composition comprising: This composition can be used with an alkali developer having a normal concentration, can form a high-resolution rectangular line-and-space resist pattern, and provides a chemically amplified negative type resist which is free from a resist pattern defect (bridging or chip line) after development and has excellent sensitivity, developability and dimensional fidelity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.