Toshiyuki Kai
14Patents
3h-index
17Co-inventors
57Inventor score
Filing activity: Apr 23, 1980 → Dec 19, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6468714B2 | Negative radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 5 | Expired |
| US4338286A | Process for recovering uranium and/or thorium from a liquid containing uranium and/or thorium | Chemistry; Metallurgy | 4 | Expired |
| US8119324B2 | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film | Emerging Cross-Sectional Technologies | 3 | Active |
| US8173351B2 | Compound and radiation-sensitive composition | Emerging Cross-Sectional Technologies | 3 | Active |
| US6403288B1 | Resist pattern formation method | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8361691B2 | Radiation-sensitive composition and process for producing low-molecular compound for use therein | Physics | 1 | Active |
| US8377627B2 | Compound and radiation-sensitive composition | Chemistry; Metallurgy | 1 | Active |
| US8809476B2 | Polymer | Physics | 0 | Active |
| US8450045B2 | Pattern forming method | Emerging Cross-Sectional Technologies | 0 | Active |
| US8771923B2 | Radiation-sensitive composition | Physics | 0 | Active |
| US7323284B2 | Negative type radiation sensitive resin composition | Emerging Cross-Sectional Technologies | 0 | Expired |
| US8470513B2 | Radiation-sensitive resin composition and polymer | Physics | 0 | Active |
| US8334087B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | Physics | 0 | Active |
| US8173348B2 | Method of forming pattern and composition for forming of organic thin-film for use therein | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.